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Tuesday, May 31, 2016

ratti, mouttet, etter

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REVERSED
Tech Center 1600 Biotechnology and Organic Chemistry
1621 Ex Parte Nakazawa 11587022 - (D) GRIMES 103 GOODWIN PROCTER LLP FAY, ZOHREH A

Tech Center 2400 Networking, Multiplexing, Cable, and Security
2484 Ex Parte Fröjdh et al 13502242 - (D) McCARTNEY 102 COATS & BENNETT, PLLC DANG, HUNG Q

Tech Center 2600 Communications
2685 Ex Parte Johnson et al 13111500 - (D) CRAIG 102/103 YEE & ASSOCIATES P.C. BOUSONO, ORLANDO

Tech Center 3600 Transportation, Construction, Electronic Commerce, Agriculture, National Security, and License & Review
3649 Ex Parte Lumley et al 12550383 - (D) MacDONALD 103 HP Inc, BROWN, SHEREE N

AFFIRMED-IN-PART
Tech Center 2100 Computer Architecture and Software
2161 Ex Parte Bhandarkar et al 11014149 - (D) STEPHENS 102 102/103 Salesforce.com/Haynes Beffel & Wolfeld LLP LE, HUNG D

Tech Center 3600 Transportation, Construction, Electronic Commerce, Agriculture, National Security, and License & Review
3623 Ex Parte Tevanian et al 11753128 - (D) WORTH 103 101 Law Office of J. Nicholas Gross, Prof. Corp. STERRETT, JONATHAN G

Tech Center 3700 Mechanical Engineering, Manufacturing, and Products & Design
3731 Ex Parte Marks et al 12275126 - (D) CAL VE 103 103 INSKEEP INTELLECTUAL PROPERTY GROUP, INC RODJOM, KATHERINE MARIE

AFFIRMED
Tech Center 1700 Chemical & Materials Engineering
1755 Ex Parte Stan et al 12123864 - (D) COLAIANNI 103/double patenting SolAero Technologies Corp. CHERN, CHRISTINA

1756 Ex Parte Ramm 12428699 - (D) SMITH 103 Pearne & Gordon LLP ABRAHAM, IBRAHIME A

1768 Ex Parte Zhou et al 11698518 - (D) COLAIANNI 103 HP Inc. FINK, BRIEANN R

1778 Ex Parte Murthy et al 12957240 - (D) ROSS 103 GENERAL ELECTRIC COMPANY PERRIN, CLARE M

Combinations of prior art that change the "basic principles under which the [prior art] was designed to operate" may weigh against a conclusion of obviousness. In re Ratti, 270 F.2d 810, 813 (CCPA 1959). However, "[i]t is well-established that a determination of obviousness based on teachings from multiple references does not require an actual, physical substitution of elements." In re Mouttet, 686 F.3d 1322, 1332 (Fed. Cir. 2012) (citing In re Etter, 756 F.2d 852, 859 (Fed. Cir. 1985) (en banc) (further citations omitted).

Ratti, In re, 270 F.2d 810, 123 USPQ 349 (CCPA 1959) 2143.01

Etter, In re, 756 F.2d 852, 225 USPQ 1 (Fed. Cir. 1985) 2258 2279 2286 2642 2686.04

Tech Center 2100 Computer Architecture and Software
2177 Ex Parte Kumar et al 11592786 - (D) DANG 103 Dilworth IP - SAP SCHALLHORN, TYLER J

Tech Center 2400 Networking, Multiplexing, Cable, and Security
2422 Ex Parte Bishop et al 13276833 - (D) SMITH 102/103 WITHROW & TERRANOVA, PLLC LEE, MICHAEL

Tech Center 2600 Communications
2621 Ex Parte Lee et al 11848501 - (D) CRAIG 103 FARJ AMI & FARJAMI LLP MIDKIFF, AARON

2623 Ex Parte Zehner et al 12553120 - (D) BAIN 103 E INK CORPORATION MATHEWS, CRYSTAL

2658 Ex Parte Katpelly et al 12251835 - (D) DROESCH 103 Concert Technology Corporation COLUCCI, MICHAEL C

Tech Center 2800 Semiconductors, Electrical and Optical Systems and Components
2886 Ex Parte Floyd et al 13047180 - (D) SAADAT 103 KNOBBE, MARTENS, OLSON & BEAR, LLP NIXON, OMAR H

Tech Center 3600 Transportation, Construction, Electronic Commerce, Agriculture, National Security, and License & Review
3646 Ex Parte Huber et al 11618424 - (D) SMEGAL 103 LEYDIG VOIT & MA YER, LTD NGUYEN, CHUONG P

Tech Center 3700 Mechanical Engineering, Manufacturing, and Products & Design
3711 Ex Parte Davidson et al 12925400 - (D) WARNER 112(1) 112(1)/103 LADAS & PARRY LLP ARYANPOUR, MITRA

REEXAMINATION

AFFIRMED
Tech Center 2800 Semiconductors, Electrical and Optical Systems and Components
2821 ZHEJIANG TRIMONE ELECTRIC SCIENCE & TECHNOLOGY CO., LTD. and FUJIAN HONGAN ELEC. CO., Third Party Requesters, v. LEVITON MANUFACTURING CO., INC., Patent Owner Ex Parte 7737809 et al 11/618,673 95001992 - (D) BAUMEISTER 103 Carter, DeLuca, Farrell & Schmidt, LLP Leviton Manufacturing Company Incorporated (CDFS) Third Party Requester: MEI & MARK LLP TON, MY TRANG original VU, DAVID HUNG

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